dc.contributor.author | Hermans, Jan | |
dc.contributor.author | Laidler, David | |
dc.contributor.author | Foubert, Philippe | |
dc.contributor.author | D'have, Koen | |
dc.contributor.author | Cheng, Shaunee | |
dc.contributor.author | Hendrickx, Eric | |
dc.contributor.author | Dusa, Mircea | |
dc.date.accessioned | 2021-10-20T11:35:51Z | |
dc.date.available | 2021-10-20T11:35:51Z | |
dc.date.issued | 2012 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20807 | |
dc.source | IIOimport | |
dc.title | Progress in EUV Lithography towards manufacturing from an exposure tool perspective | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Hermans, Jan | |
dc.contributor.imecauthor | Laidler, David | |
dc.contributor.imecauthor | Foubert, Philippe | |
dc.contributor.imecauthor | D'have, Koen | |
dc.contributor.imecauthor | Hendrickx, Eric | |
dc.contributor.imecauthor | Dusa, Mircea | |
dc.contributor.orcidimec | Hermans, Jan::0000-0003-1249-8902 | |
dc.contributor.orcidimec | Laidler, David::0000-0003-4055-3366 | |
dc.contributor.orcidimec | D'have, Koen::0000-0002-5195-9241 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 832202 | |
dc.source.conference | Extreme Ultraviolet (EUV) Lithography III | |
dc.source.conferencedate | 12/02/2012 | |
dc.source.conferencelocation | San Jose, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings of SPIE; Vol.8322 | |