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NA/sigma optimisation strategies for an advanced DUV stepper applied to 0.25 mm and sub-0.25 mm critical levels

dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorRonse, Kurt
dc.contributor.authorGhandehari, Kouros
dc.contributor.authorJaenen, Patrick
dc.contributor.authorBotermans, Harry
dc.contributor.authorFinders, Jo
dc.contributor.authorLilygren, John
dc.contributor.authorBaker, Daniel
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-09-30T09:23:51Z
dc.date.available2021-09-30T09:23:51Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2081
dc.sourceIIOimport
dc.titleNA/sigma optimisation strategies for an advanced DUV stepper applied to 0.25 mm and sub-0.25 mm critical levels
dc.typeProceedings paper
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage320
dc.source.endpage332
dc.source.conferenceOptical Microlithography X
dc.source.conferencedate12/03/1997
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 3051


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