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Hafnium aluminates deposited by atomic layer deposition: Structural characterization by X-ray spectroscopy

dc.contributor.authorHuanca, D.R.
dc.contributor.authorChristiano, V.
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorKellerman, G.
dc.contributor.authorVerdonck, Patrick
dc.contributor.authordos Santos Filho, S.
dc.date.accessioned2021-10-20T11:43:04Z
dc.date.available2021-10-20T11:43:04Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20831
dc.sourceIIOimport
dc.titleHafnium aluminates deposited by atomic layer deposition: Structural characterization by X-ray spectroscopy
dc.typeProceedings paper
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.source.peerreviewyes
dc.source.beginpage383
dc.source.endpage390
dc.source.conferenceProceedings of the 27th Symposium on Microelectronics Technology and Devices - SBMicro
dc.source.conferencedate30/08/2012
dc.source.conferencelocationBrasilia Brazil
dc.identifier.urlhttp://ecst.ecsdl.org/content/49/1/383.abstract
imec.availabilityPublished - imec
imec.internalnotesECS Transactions; Vol. 49, Issue 1


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