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Electroless copper bath stability monitoring with UV-VIS spectroscopy, pH, and mixed potential measurements

dc.contributor.authorInoue, Fumihiro
dc.contributor.authorPhilipsen, Harold
dc.contributor.authorRadisic, Alex
dc.contributor.authorArmini, Silvia
dc.contributor.authorCivale, Yann
dc.contributor.authorShingubara, Shoso
dc.contributor.authorLeunissen, Peter
dc.date.accessioned2021-10-20T11:48:07Z
dc.date.available2021-10-20T11:48:07Z
dc.date.issued2012
dc.identifier.issn0013-4651
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20848
dc.sourceIIOimport
dc.titleElectroless copper bath stability monitoring with UV-VIS spectroscopy, pH, and mixed potential measurements
dc.typeJournal article
dc.contributor.imecauthorInoue, Fumihiro
dc.contributor.imecauthorPhilipsen, Harold
dc.contributor.imecauthorRadisic, Alex
dc.contributor.imecauthorArmini, Silvia
dc.contributor.orcidimecPhilipsen, Harold::0000-0002-5029-1104
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.source.peerreviewyes
dc.source.beginpageD437
dc.source.endpageD441
dc.source.journalJournal of the Electrochemical Society
dc.source.issue7
dc.source.volume159
dc.identifier.urlhttp://dx.doi.org/10.1149/2.070207jes
imec.availabilityPublished - imec


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