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Integrated cleaning and handling automation of NXE3100 reticles

dc.contributor.authorJonckheere, Rik
dc.contributor.authorWaehler, Tobias
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorDietze, Uwe
dc.contributor.authorDress, Peter
dc.contributor.authorBrux, Oliver
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-20T11:55:56Z
dc.date.available2021-10-20T11:55:56Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20874
dc.sourceIIOimport
dc.titleIntegrated cleaning and handling automation of NXE3100 reticles
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.beginpage83520U
dc.source.conference28th European Mask and Lithography Conference
dc.source.conferencedate17/01/2012
dc.source.conferencelocationDresden Germany
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 8352


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