Authors

Jourdan, Nicolas; Baklanov, Mikhaïl; Meersschaut, Johan; Vereecke, Guy; Conard, Thierry; Wilson, Chris; Ablett, James; Fonda, Emiliano; Geypen, Jef; Siew, Yong Kong; Van Elshocht, Sven; Tokei, Zsolt

Conference

MRS Spring Symposium C: Interconnect Challenges for CMOS Technology

Title

Study of deposition behavior of thermal/plasma-enhanced chemical vapor deposition (CVD/PECVD) of manganese on porous SiCOH low-k dielectric materials for copper diffusion barrier application in advanced interconnect technology

Publication type

Meeting abstract