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Study of chemical vapor deposition of manganese on porous SiCOH low-k dielectrics using Bis(ethylcyclopentadienyl)manganese

dc.contributor.authorJourdan, Nicolas
dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorWilson, Chris
dc.contributor.authorAblett, J.
dc.contributor.authorFonda, E.
dc.contributor.authorZhao, Larry
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorTokei, Zsolt
dc.contributor.authorVancoille, Eric
dc.date.accessioned2021-10-20T11:57:55Z
dc.date.available2021-10-20T11:57:55Z
dc.date.issued2012
dc.identifier.issn1099-0062
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20880
dc.sourceIIOimport
dc.titleStudy of chemical vapor deposition of manganese on porous SiCOH low-k dielectrics using Bis(ethylcyclopentadienyl)manganese
dc.typeJournal article
dc.contributor.imecauthorJourdan, Nicolas
dc.contributor.imecauthorKrishtab, Mikhail
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorVancoille, Eric
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpageH176
dc.source.endpageH178
dc.source.journalElectrochemical and Solid-State Letters
dc.source.issue5
dc.source.volume15
imec.availabilityPublished - open access


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