Ultra-low-k by CVD: deposition and curing
dc.contributor.author | Jousseaume, Vincent | |
dc.contributor.author | Zenasni, Aziz | |
dc.contributor.author | Gourhant, Olivier | |
dc.contributor.author | Favennec, Laurent | |
dc.contributor.author | Baklanov, Mikhaïl | |
dc.date.accessioned | 2021-10-20T11:58:13Z | |
dc.date.available | 2021-10-20T11:58:13Z | |
dc.date.issued | 2012 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20881 | |
dc.source | IIOimport | |
dc.title | Ultra-low-k by CVD: deposition and curing | |
dc.type | Book chapter | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 35 | |
dc.source.book | Advanced Interconnects for ULSI Technology | |
dc.source.endpage | 78 | |
imec.availability | Published - open access |