dc.contributor.author | Kesters, Els | |
dc.contributor.author | Le, Quoc Toan | |
dc.contributor.author | Lux, Marcel | |
dc.contributor.author | Pittevils, Joris | |
dc.contributor.author | Vereecke, Guy | |
dc.contributor.author | Struyf, Herbert | |
dc.contributor.author | De Gendt, Stefan | |
dc.date.accessioned | 2021-10-20T12:09:21Z | |
dc.date.available | 2021-10-20T12:09:21Z | |
dc.date.issued | 2012 | |
dc.identifier.issn | 0013-4651 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20915 | |
dc.source | IIOimport | |
dc.title | Towards fully aqueous ozone wet strip of 193 nm photoresist stack using UV pre-treatments in low-k patterning applications | |
dc.type | Journal article | |
dc.contributor.imecauthor | Kesters, Els | |
dc.contributor.imecauthor | Le, Quoc Toan | |
dc.contributor.imecauthor | Lux, Marcel | |
dc.contributor.imecauthor | Vereecke, Guy | |
dc.contributor.imecauthor | Struyf, Herbert | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.orcidimec | Le, Quoc Toan::0000-0002-0206-6279 | |
dc.contributor.orcidimec | Vereecke, Guy::0000-0001-9058-9338 | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | D287 | |
dc.source.endpage | D295 | |
dc.source.journal | Journal of the Electrochemical Society | |
dc.source.issue | 5 | |
dc.source.volume | 159 | |
imec.availability | Published - open access | |