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Towards fully aqueous ozone wet strip of 193 nm photoresist stack using UV pre-treatments in low-k patterning applications

dc.contributor.authorKesters, Els
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorLux, Marcel
dc.contributor.authorPittevils, Joris
dc.contributor.authorVereecke, Guy
dc.contributor.authorStruyf, Herbert
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-20T12:09:21Z
dc.date.available2021-10-20T12:09:21Z
dc.date.issued2012
dc.identifier.issn0013-4651
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20915
dc.sourceIIOimport
dc.titleTowards fully aqueous ozone wet strip of 193 nm photoresist stack using UV pre-treatments in low-k patterning applications
dc.typeJournal article
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpageD287
dc.source.endpageD295
dc.source.journalJournal of the Electrochemical Society
dc.source.issue5
dc.source.volume159
imec.availabilityPublished - open access


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