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Towards fully aqueous ozone wet strip of 193 nm photoresist stack using UV pre-treatments in low-k patterning applications
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Authors
Kesters, Els
;
Le, Quoc Toan
;
Lux, Marcel
;
Pittevils, Joris
;
Vereecke, Guy
;
Struyf, Herbert
;
De Gendt, Stefan
ISSN
0013-4651
Issue
5
Journal
Journal of the Electrochemical Society
Volume
159
Title
Towards fully aqueous ozone wet strip of 193 nm photoresist stack using UV pre-treatments in low-k patterning applications
Publication type
Journal article
Embargo date
9999-12-31
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