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Towards fully aqueous ozone wet strip of 193 nm photoresist stack using UV pre-treatments in low-k patterning applications
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Towards fully aqueous ozone wet strip of 193 nm photoresist stack using UV pre-treatments in low-k patterning applications
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Date
2012
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kesters, Els
;
Le, Quoc Toan
;
Lux, Marcel
;
Pittevils, Joris
;
Vereecke, Guy
;
Struyf, Herbert
;
De Gendt, Stefan
Journal
Journal of the Electrochemical Society
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1909
since deposited on 2021-10-20
Acq. date: 2025-12-15
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1909
since deposited on 2021-10-20
Acq. date: 2025-12-15
Citations