Publication:

Towards fully aqueous ozone wet strip of 193 nm photoresist stack using UV pre-treatments in low-k patterning applications

Date

2012
Journal article
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dc.contributor.authorKesters, Els
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorLux, Marcel
dc.contributor.authorPittevils, Joris
dc.contributor.authorVereecke, Guy
dc.contributor.authorStruyf, Herbert
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-20T12:09:21Z
dc.date.available2021-10-20T12:09:21Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.issn0013-4651
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20915
dc.source.beginpageD287
dc.source.endpageD295
dc.source.issue5
dc.source.journalJournal of the Electrochemical Society
dc.source.volume159
dc.title

Towards fully aqueous ozone wet strip of 193 nm photoresist stack using UV pre-treatments in low-k patterning applications

dc.typeJournal article
dspace.entity.typePublication
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