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Influence and evolution of 193i resist composition during VUV exposure

dc.contributor.authorKunnen, Eddy
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-20T12:26:36Z
dc.date.available2021-10-20T12:26:36Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20967
dc.sourceIIOimport
dc.titleInfluence and evolution of 193i resist composition during VUV exposure
dc.typeMeeting abstract
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorGronheid, Roel
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.source.peerreviewyes
dc.source.conference4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials - ISPlasma
dc.source.conferencedate4/03/2012
dc.source.conferencelocationAichi Japan
imec.availabilityPublished - imec


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