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Mix and match overlay optimization for advanced lithography tools (193i and EUV)

dc.contributor.authorLaidler, David
dc.contributor.authorD'have, Koen
dc.contributor.authorHermans, Jan
dc.contributor.authorCheng, Shaunee
dc.date.accessioned2021-10-20T12:31:31Z
dc.date.available2021-10-20T12:31:31Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20982
dc.sourceIIOimport
dc.titleMix and match overlay optimization for advanced lithography tools (193i and EUV)
dc.typeProceedings paper
dc.contributor.imecauthorLaidler, David
dc.contributor.imecauthorD'have, Koen
dc.contributor.imecauthorHermans, Jan
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.contributor.orcidimecD'have, Koen::0000-0002-5195-9241
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage83260M
dc.source.conferenceOptical Microlithography XXV
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedgins of SPIE; Vol. 8326


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