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Modification of post-etch residues by UV for wet removal

dc.contributor.authorLe, Quoc Toan
dc.contributor.authorDrieskens, Frederik
dc.contributor.authorConard, Thierry
dc.contributor.authorLux, Marcel
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorStruyf, Herbert
dc.contributor.authorVereecke, Guy
dc.date.accessioned2021-10-20T12:34:27Z
dc.date.available2021-10-20T12:34:27Z
dc.date.issued2012
dc.identifier.issn1662-9779
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20991
dc.sourceIIOimport
dc.titleModification of post-etch residues by UV for wet removal
dc.typeJournal article
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorVereecke, Guy
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.source.peerreviewyes
dc.source.beginpage207
dc.source.endpage210
dc.source.journalSolid State Phenomena
dc.source.volume187
imec.availabilityPublished - imec
imec.internalnotesPaper from the 10th Int. Symp. on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) 2010


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