Show simple item record

Formation of fluorocarbon polymer and its removal in back-end-of-line processing of advanced CMOS integrated circuits

dc.contributor.authorLe, Quoc Toan
dc.contributor.authorVereecke, Guy
dc.contributor.authorKesters, Els
dc.contributor.authorStruyf, Herbert
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-20T12:35:07Z
dc.date.available2021-10-20T12:35:07Z
dc.date.issued2012-11
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20993
dc.sourceIIOimport
dc.titleFormation of fluorocarbon polymer and its removal in back-end-of-line processing of advanced CMOS integrated circuits
dc.typeMeeting abstract
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.conference6th International Workshop on Advanced Materials Science and Nanotechnology - IWAMSN
dc.source.conferencedate30/10/2012
dc.source.conferencelocationHa Long City Vietnam
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record