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Overlay accuracy with respect to device scaling

dc.contributor.authorLeray, Philippe
dc.contributor.authorLaidler, David
dc.contributor.authorCheng, Shaunee
dc.date.accessioned2021-10-20T12:39:16Z
dc.date.available2021-10-20T12:39:16Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21006
dc.sourceIIOimport
dc.titleOverlay accuracy with respect to device scaling
dc.typeProceedings paper
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorLaidler, David
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage832409
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXVI
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan Jose, CA CA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 8324


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