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dc.contributor.authorLi, Jianliang
dc.contributor.authorGao, Weimin
dc.contributor.authorFan, Yongfa
dc.contributor.authorXue, Jing
dc.contributor.authorYan, Qiliang
dc.contributor.authorLucas, Kevin
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorMelvin III, Lawrence S.
dc.date.accessioned2021-10-20T12:41:42Z
dc.date.available2021-10-20T12:41:42Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21013
dc.sourceIIOimport
dc.titleBinary modeling method to check the sub-resolution assist features (SRAFs) printability
dc.typeProceedings paper
dc.contributor.imecauthorDe Bisschop, Peter
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage83261D
dc.source.conferenceOptical Microlithography XXV
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol. 8326


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