Binary modeling method to check the sub-resolution assist features (SRAFs) printability
dc.contributor.author | Li, Jianliang | |
dc.contributor.author | Gao, Weimin | |
dc.contributor.author | Fan, Yongfa | |
dc.contributor.author | Xue, Jing | |
dc.contributor.author | Yan, Qiliang | |
dc.contributor.author | Lucas, Kevin | |
dc.contributor.author | De Bisschop, Peter | |
dc.contributor.author | Melvin III, Lawrence S. | |
dc.date.accessioned | 2021-10-20T12:41:42Z | |
dc.date.available | 2021-10-20T12:41:42Z | |
dc.date.issued | 2012 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/21013 | |
dc.source | IIOimport | |
dc.title | Binary modeling method to check the sub-resolution assist features (SRAFs) printability | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | De Bisschop, Peter | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 83261D | |
dc.source.conference | Optical Microlithography XXV | |
dc.source.conferencedate | 12/02/2012 | |
dc.source.conferencelocation | San Jose, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings SPIE; Vol. 8326 |