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Implantation and activation of phosphorus in amorphous and crystalline Ge on Si

dc.contributor.authorLieten, Ruben
dc.contributor.authorBeeman, Jeff W.
dc.contributor.authorSimoen, Eddy
dc.contributor.authorHaller, Eugene E.
dc.contributor.authorDekoster, Johan
dc.contributor.authorLocquet, Jean-Pierre
dc.date.accessioned2021-10-20T12:46:41Z
dc.date.available2021-10-20T12:46:41Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21027
dc.sourceIIOimport
dc.titleImplantation and activation of phosphorus in amorphous and crystalline Ge on Si
dc.typeOral presentation
dc.contributor.imecauthorLieten, Ruben
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorDekoster, Johan
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.source.peerreviewno
dc.source.conferenceE-MRS Spring Meeting Symposium M : More than Moore: Novel materials approaches for functionalized Silicon based Microelectronics
dc.source.conferencedate14/04/2012
dc.source.conferencelocationStrasbourg France
imec.availabilityPublished - imec


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