Optimized post-CMP and pre-Epi cleans to enable smooth and high quality epitaxial strained Ge growth on SiGe strain relaxed buffers

Publication:

2012

Journal article

Author(s)

;

;

;

;

Solid State Phenomena

1841 since deposited on 2021-10-20

1last month

Acq. date: 2025-12-16