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Design compliance for Spacer Is Dielectric (SID) patterning

dc.contributor.authorLuk-Pat, Gerard
dc.contributor.authorMiloslavsky, Alex
dc.contributor.authorPainter, Ben
dc.contributor.authorLin, Li
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorLucas, Kevin
dc.date.accessioned2021-10-20T13:01:15Z
dc.date.available2021-10-20T13:01:15Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21067
dc.sourceIIOimport
dc.titleDesign compliance for Spacer Is Dielectric (SID) patterning
dc.typeProceedings paper
dc.contributor.imecauthorDe Bisschop, Peter
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage83260D
dc.source.conferenceOptical Microlithography XXV
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol. 8326


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