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3D Mask modeling for EUV lithography

dc.contributor.authorMailfert, Julien
dc.contributor.authorZuniga, Christian
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorAdam, Konstantinos
dc.contributor.authorLam, Michael
dc.contributor.authorWord, James
dc.contributor.authorHendrickx, Eric
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorSmith, Bruce
dc.date.accessioned2021-10-20T13:05:03Z
dc.date.available2021-10-20T13:05:03Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21077
dc.sourceIIOimport
dc.title3D Mask modeling for EUV lithography
dc.typeProceedings paper
dc.contributor.imecauthorMailfert, Julien
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage832224
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography III
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol. 8322


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