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Wafer scale processing of plasmonic nanoslit arrays in 200mm CMOS fab environment

dc.contributor.authorMalachowski, Karl
dc.contributor.authorVerbeeck, Rita
dc.contributor.authorDupont, Tania
dc.contributor.authorChen, Chang
dc.contributor.authorLi, Yi
dc.contributor.authorMusa, Silke
dc.contributor.authorStakenborg, Tim
dc.contributor.authorSabuncuoglu Tezcan, Deniz
dc.contributor.authorVan Dorpe, Pol
dc.date.accessioned2021-10-20T13:07:22Z
dc.date.available2021-10-20T13:07:22Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21083
dc.sourceIIOimport
dc.titleWafer scale processing of plasmonic nanoslit arrays in 200mm CMOS fab environment
dc.typeProceedings paper
dc.contributor.imecauthorVerbeeck, Rita
dc.contributor.imecauthorDupont, Tania
dc.contributor.imecauthorStakenborg, Tim
dc.contributor.imecauthorSabuncuoglu Tezcan, Deniz
dc.contributor.imecauthorVan Dorpe, Pol
dc.contributor.orcidimecStakenborg, Tim::0000-0001-9878-9078
dc.contributor.orcidimecSabuncuoglu Tezcan, Deniz::0000-0002-9237-7862
dc.contributor.orcidimecVan Dorpe, Pol::0000-0003-0918-1664
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage413
dc.source.endpage422
dc.source.conferenceChemical Sensors 10 - and- MEMS/NEMS 10
dc.source.conferencedate7/10/2012
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 12


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