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Development of AlGaN recess etch for Emode POWER HEMTs

dc.contributor.authorMannaert, Geert
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorDe Jaeger, Brice
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorDemand, Marc
dc.contributor.authorDecoutere, Stefaan
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-20T13:10:46Z
dc.date.available2021-10-20T13:10:46Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21092
dc.sourceIIOimport
dc.titleDevelopment of AlGaN recess etch for Emode POWER HEMTs
dc.typeMeeting abstract
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorDe Jaeger, Brice
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecDe Jaeger, Brice::0000-0001-8804-7556
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewyes
dc.source.conferencePlasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate15/03/2012
dc.source.conferencelocationGrenoble France
imec.availabilityPublished - imec


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