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Manufacturing challenges of GaN-on-Si HEMTs in a 200 mm CMOS fab

dc.contributor.authorMarcon, Denis
dc.contributor.authorDe Jaeger, Brice
dc.contributor.authorHalder, Sandip
dc.contributor.authorVranckx, Nick
dc.contributor.authorMannaert, Geert
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorDecoutere, Stefaan
dc.date.accessioned2021-10-20T13:11:08Z
dc.date.available2021-10-20T13:11:08Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21093
dc.sourceIIOimport
dc.titleManufacturing challenges of GaN-on-Si HEMTs in a 200 mm CMOS fab
dc.typeProceedings paper
dc.contributor.imecauthorMarcon, Denis
dc.contributor.imecauthorDe Jaeger, Brice
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorVranckx, Nick
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.orcidimecDe Jaeger, Brice::0000-0001-8804-7556
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.source.peerreviewyes
dc.source.conferenceInternational Smposium on Semiconductor Manufacturing - ISSM
dc.source.conferencedate15/10/2012
dc.source.conferencelocationTokio Japan
imec.availabilityPublished - imec


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