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Fluorocarbon-based passivation in STI plasma etching

dc.contributor.authorMilenin, Alexey
dc.contributor.authorAthimulam, Raja
dc.contributor.authorDemand, Marc
dc.contributor.authorCoenegrachts, Bart
dc.date.accessioned2021-10-20T13:30:39Z
dc.date.available2021-10-20T13:30:39Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21144
dc.sourceIIOimport
dc.titleFluorocarbon-based passivation in STI plasma etching
dc.typeMeeting abstract
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorAthimulam, Raja
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorCoenegrachts, Bart
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.source.peerreviewno
dc.source.conferencePlasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate15/03/2012
dc.source.conferencelocationGrenoble France
imec.availabilityPublished - imec


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