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Direct SiGe BFFT patterning by dry plasma etching

dc.contributor.authorMilenin, Alexey
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorDeweerdt, Bruno
dc.contributor.authorVrancken, Christa
dc.contributor.authorDemand, Marc
dc.date.accessioned2021-10-20T13:31:24Z
dc.date.available2021-10-20T13:31:24Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21146
dc.sourceIIOimport
dc.titleDirect SiGe BFFT patterning by dry plasma etching
dc.typeMeeting abstract
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorDeweerdt, Bruno
dc.contributor.imecauthorVrancken, Christa
dc.contributor.imecauthorDemand, Marc
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.source.peerreviewyes
dc.source.beginpage2922
dc.source.conferenceECS Fall Meeting Symposium E13: Plasma Processing 19
dc.source.conferencedate7/10/2012
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - imec
imec.internalnotesECS Meeting Abstracts; Vol. 2012-02


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