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Scanning Spreading Resistance Microscopy for carrier profiling beyond 32nm node

dc.contributor.authorMody, Jay
dc.contributor.authorZschaetzsch, Gerd
dc.contributor.authorKoelling, Sebastian
dc.contributor.authorDe Keersgieter, An
dc.contributor.authorEneman, Geert
dc.contributor.authorKambham, Ajay Kumar
dc.contributor.authorDrijbooms, Chris
dc.contributor.authorSchulze, Andreas
dc.contributor.authorChiarella, Thomas
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorEyben, Pierre
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-20T13:37:28Z
dc.date.available2021-10-20T13:37:28Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21161
dc.sourceIIOimport
dc.titleScanning Spreading Resistance Microscopy for carrier profiling beyond 32nm node
dc.typeProceedings paper
dc.contributor.imecauthorDe Keersgieter, An
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorDrijbooms, Chris
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecDe Keersgieter, An::0000-0002-5527-8582
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage94
dc.source.endpage99
dc.source.conferenceInternational Workshop on Junction Technology - IWJT
dc.source.conferencedate14/05/2012
dc.source.conferencelocationShanghai China
imec.availabilityPublished - open access


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