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Source-mask optimization incorporating a physical resist model and manufacturability constraints

dc.contributor.authorMulders, Thomas
dc.contributor.authorDomnenko, Vitaliy
dc.contributor.authorKuechler, Bernd
dc.contributor.authorStock, Hans-Juergen
dc.contributor.authorKlostermann, Ulrich
dc.contributor.authorDe Bisschop, Peter
dc.date.accessioned2021-10-20T13:42:37Z
dc.date.available2021-10-20T13:42:37Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21174
dc.sourceIIOimport
dc.titleSource-mask optimization incorporating a physical resist model and manufacturability constraints
dc.typeProceedings paper
dc.contributor.imecauthorDe Bisschop, Peter
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage83260G
dc.source.conferenceOptical Microlithography XXV
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol. 8326


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