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Polyether suppressors for filling sub 30 nm features by direct plating

dc.contributor.authorNagar, Magi
dc.contributor.authorRadisic, Alex
dc.contributor.authorStrubbe, Katrien
dc.contributor.authorVereecken, Philippe
dc.date.accessioned2021-10-20T13:47:28Z
dc.date.available2021-10-20T13:47:28Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21186
dc.sourceIIOimport
dc.titlePolyether suppressors for filling sub 30 nm features by direct plating
dc.typeProceedings paper
dc.contributor.imecauthorRadisic, Alex
dc.contributor.imecauthorVereecken, Philippe
dc.contributor.orcidimecVereecken, Philippe::0000-0003-4115-0075
dc.source.peerreviewyes
dc.source.conferenceElectrochemistry 2012
dc.source.conferencedate17/09/2012
dc.source.conferencelocationMunich Germany
imec.availabilityPublished - imec


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