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Overview of FRONT-END CMP processes for 28nm and beyond

dc.contributor.authorOng, Patrick
dc.contributor.authorDevriendt, Katia
dc.date.accessioned2021-10-20T14:02:20Z
dc.date.available2021-10-20T14:02:20Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21223
dc.sourceIIOimport
dc.titleOverview of FRONT-END CMP processes for 28nm and beyond
dc.typeOral presentation
dc.contributor.imecauthorOng, Patrick
dc.contributor.imecauthorDevriendt, Katia
dc.contributor.orcidimecOng, Patrick::0000-0002-2072-292X
dc.contributor.orcidimecDevriendt, Katia::0000-0002-0662-7926
dc.source.peerreviewno
dc.source.conferenceInternational Conference on Planarization/CMP Technology - ICPT
dc.source.conferencedate15/10/2012
dc.source.conferencelocationGrenoble France
dc.identifier.urlwww.icpt2012.com
imec.availabilityPublished - imec


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