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CMP process development for high mobility channel materials

dc.contributor.authorOng, Patrick
dc.contributor.authorGillot, C.
dc.contributor.authorAnsar, S.
dc.contributor.authorNoller, B.
dc.contributor.authorLi, Y.
dc.date.accessioned2021-10-20T14:02:41Z
dc.date.available2021-10-20T14:02:41Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21224
dc.sourceIIOimport
dc.titleCMP process development for high mobility channel materials
dc.typeProceedings paper
dc.contributor.imecauthorOng, Patrick
dc.contributor.orcidimecOng, Patrick::0000-0002-2072-292X
dc.source.peerreviewyes
dc.source.conferenceInternational Conference on Planarization/CMP Technology - ICPT
dc.source.conferencedate15/10/2012
dc.source.conferencelocationGrenoble France
imec.availabilityPublished - imec


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