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Ge, III/V Materials CMP

dc.contributor.authorOng, Patrick
dc.contributor.authorLan, Yongqing
dc.contributor.authorNoller, Bastian
dc.contributor.authorGillot, Christophe
dc.contributor.authorUsman Ibrahim, Ansar
dc.contributor.authorLauter, Michael
dc.contributor.authorGolzarian, Reza
dc.contributor.authorLi, Yuzhuo
dc.date.accessioned2021-10-20T14:03:05Z
dc.date.available2021-10-20T14:03:05Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21225
dc.sourceIIOimport
dc.titleGe, III/V Materials CMP
dc.typeOral presentation
dc.contributor.imecauthorOng, Patrick
dc.contributor.imecauthorUsman Ibrahim, Ansar
dc.contributor.orcidimecOng, Patrick::0000-0002-2072-292X
dc.source.peerreviewno
dc.source.conferenceCAMP's 17th International Symposium on Chemical-Mechanical Planarization
dc.source.conferencedate12/08/2012
dc.source.conferencelocationLake Placid, NY USA
imec.availabilityPublished - imec


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