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Future trends of semiconductor process technology

dc.contributor.authorOng, Patrick
dc.contributor.authorTokei, Zsolt
dc.contributor.authorThean, Aaron
dc.contributor.authorHoriguchi, Naoto
dc.date.accessioned2021-10-20T14:04:14Z
dc.date.available2021-10-20T14:04:14Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21228
dc.sourceIIOimport
dc.titleFuture trends of semiconductor process technology
dc.typeProceedings paper
dc.contributor.imecauthorOng, Patrick
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorThean, Aaron
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecOng, Patrick::0000-0002-2072-292X
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.source.peerreviewyes
dc.source.conferenceInternational Symposium on Future Prospects for Semiconductor Device and CMP Process
dc.source.conferencedate16/09/2012
dc.source.conferencelocationKitakyushu Japan
imec.availabilityPublished - imec


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