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In-Situ HCl etching of InP in shallow-trench-isolated structures
Publication:
In-Situ HCl etching of InP in shallow-trench-isolated structures
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Date
2012
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Orzali, Tommaso
;
Wang, G.
;
Waldron, Niamh
;
Merckling, Clement
;
Richard, Olivier
;
Bender, Hugo
;
Wang, Wei-E
;
Caymax, Matty
Journal
Journal of the Electrochemical Society
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1866
since deposited on 2021-10-20
Acq. date: 2025-12-11
Citations
Metrics
Views
1866
since deposited on 2021-10-20
Acq. date: 2025-12-11
Citations