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NiO thin films synthesized by atomic layer deposition using Ni(dmamb)2 and O3 as precursors

dc.contributor.authorPeter, Antony
dc.contributor.authorToeller, Michael
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorFranquet, Alexis
dc.contributor.authorRichard, Olivier
dc.contributor.authorTielens, Hilde
dc.contributor.authorBrijs, Bert
dc.contributor.authorMoussa, Alain
dc.contributor.authorConard, Thierry
dc.contributor.authorBender, Hugo
dc.contributor.authorSchaekers, Marc
dc.contributor.authorKittl, Jorge
dc.contributor.authorJurczak, Gosia
dc.contributor.authorVan Elshocht, Sven
dc.date.accessioned2021-10-20T14:27:18Z
dc.date.available2021-10-20T14:27:18Z
dc.date.issued2012
dc.identifier.issn0948-1907
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21284
dc.sourceIIOimport
dc.titleNiO thin films synthesized by atomic layer deposition using Ni(dmamb)2 and O3 as precursors
dc.typeJournal article
dc.contributor.imecauthorPeter, Antony
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorTielens, Hilde
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.identifier.doi10.1002/cvde.201106949
dc.source.peerreviewyes
dc.source.beginpage61
dc.source.endpage69
dc.source.journalChemical Vapor Deposition
dc.source.issue1_3
dc.source.volume18
imec.availabilityPublished - imec


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