Show simple item record

Process study and characterization of VO2 thin films synthesized by ALD using TEMAV and O3 precursors

dc.contributor.authorPeter, Antony
dc.contributor.authorToeller, Michael
dc.contributor.authorRadu, Iuliana
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorSchaekers, Marc
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorConard, Thierry
dc.contributor.authorVan Elshocht, Sven
dc.date.accessioned2021-10-20T14:28:13Z
dc.date.available2021-10-20T14:28:13Z
dc.date.issued2012
dc.identifier.issn2162-8769
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21286
dc.sourceIIOimport
dc.titleProcess study and characterization of VO2 thin films synthesized by ALD using TEMAV and O3 precursors
dc.typeJournal article
dc.contributor.imecauthorPeter, Antony
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpageP169
dc.source.endpageP174
dc.source.journalECS Journal of Solid State Science and Technology
dc.source.issue4
dc.source.volume1
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
24793.pdf
Size:
1.481Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record