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Impact of mask stack on high NA EUV imaging

dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorHendrickx, Eric
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorDavydova, Natalia
dc.contributor.authorFliervoet, Timon
dc.contributor.authorNeumann, Jens Timo
dc.date.accessioned2021-10-20T14:34:06Z
dc.date.available2021-10-20T14:34:06Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21300
dc.sourceIIOimport
dc.titleImpact of mask stack on high NA EUV imaging
dc.typeOral presentation
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorFliervoet, Timon
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate1/10/2012
dc.source.conferencelocationBrussels Belgium
dc.identifier.urlhttps://www.sematech.org/10258
imec.availabilityPublished - imec


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