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Progress in understanding EUV resist related outgassing and contamination

dc.contributor.authorPollentier, Ivan
dc.contributor.authorLokasani, Ragava
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-20T14:42:56Z
dc.date.available2021-10-20T14:42:56Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21320
dc.sourceIIOimport
dc.titleProgress in understanding EUV resist related outgassing and contamination
dc.typeOral presentation
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorGronheid, Roel
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate30/09/2012
dc.source.conferencelocationBrussels belgium
imec.availabilityPublished - imec


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