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Bulk FinFET fabrication with new approaches for oxide topography control using dry removal techniques

dc.contributor.authorRedolfi, Augusto
dc.contributor.authorKubicek, Stefan
dc.contributor.authorRooyackers, Rita
dc.contributor.authorKim, Min-Soo
dc.contributor.authorSleeckx, Erik
dc.contributor.authorDevriendt, Katia
dc.contributor.authorShamiryan, Denis
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorDelande, Tinne
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorTogo, Mitsuhiro
dc.contributor.authorWouters, Johan M. D.
dc.contributor.authorJurczak, Gosia
dc.contributor.authorHoffmann, Thomas Y.
dc.contributor.authorCockburn, Andrew
dc.contributor.authorGravey, Virginie
dc.contributor.authorDiehl, D.L.
dc.date.accessioned2021-10-20T15:11:35Z
dc.date.available2021-10-20T15:11:35Z
dc.date.issued2012
dc.identifier.issn0038-1101
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21388
dc.sourceIIOimport
dc.titleBulk FinFET fabrication with new approaches for oxide topography control using dry removal techniques
dc.typeJournal article
dc.contributor.imecauthorRedolfi, Augusto
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorKim, Min-Soo
dc.contributor.imecauthorSleeckx, Erik
dc.contributor.imecauthorDevriendt, Katia
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorDelande, Tinne
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorWouters, Johan M. D.
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorCockburn, Andrew
dc.contributor.orcidimecKim, Min-Soo::0000-0003-0211-0847
dc.contributor.orcidimecSleeckx, Erik::0000-0003-2560-6132
dc.contributor.orcidimecDevriendt, Katia::0000-0002-0662-7926
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.source.peerreviewyes
dc.source.beginpage106
dc.source.endpage112
dc.source.journalSolid-State Electronics
dc.source.volume71
imec.availabilityPublished - imec


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