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Process study of gadolinium aluminate atomic layer deposition from the gadolinium tris-diisopropylacetamidinate precursor

dc.contributor.authorRodriguez, Leonard
dc.contributor.authorFranquet, Alexis
dc.contributor.authorBrijs, Bert
dc.contributor.authorTielens, Hilde
dc.contributor.authorAdelmann, Christoph
dc.date.accessioned2021-10-20T15:24:22Z
dc.date.available2021-10-20T15:24:22Z
dc.date.issued2012
dc.identifier.issn0734-2101
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21415
dc.sourceIIOimport
dc.titleProcess study of gadolinium aluminate atomic layer deposition from the gadolinium tris-diisopropylacetamidinate precursor
dc.typeJournal article
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorTielens, Hilde
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.source.peerreviewyes
dc.source.beginpage01A140
dc.source.journalJournal of Vacuum Science and Technology A
dc.source.issue1
dc.source.volume30
imec.availabilityPublished - imec


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