dc.contributor.author | Ronse, Kurt | |
dc.contributor.author | De Bisschop, Peter | |
dc.contributor.author | Vandenberghe, Geert | |
dc.contributor.author | Hendrickx, Eric | |
dc.contributor.author | Gronheid, Roel | |
dc.contributor.author | Vaglio Pret, Alessandro | |
dc.contributor.author | Mallik, Arindam | |
dc.contributor.author | Verkest, Diederik | |
dc.contributor.author | Steegen, An | |
dc.date.accessioned | 2021-10-20T15:29:19Z | |
dc.date.available | 2021-10-20T15:29:19Z | |
dc.date.issued | 2012 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/21425 | |
dc.source | IIOimport | |
dc.title | Opportunities and challenges in device scaling by the introduction of EUV lithography | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Ronse, Kurt | |
dc.contributor.imecauthor | De Bisschop, Peter | |
dc.contributor.imecauthor | Vandenberghe, Geert | |
dc.contributor.imecauthor | Hendrickx, Eric | |
dc.contributor.imecauthor | Gronheid, Roel | |
dc.contributor.imecauthor | Vaglio Pret, Alessandro | |
dc.contributor.imecauthor | Mallik, Arindam | |
dc.contributor.imecauthor | Verkest, Diederik | |
dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
dc.contributor.orcidimec | Mallik, Arindam::0000-0002-0742-9366 | |
dc.contributor.orcidimec | Verkest, Diederik::0000-0001-6567-2746 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 18.5 | |
dc.source.conference | International Electron Devices Meeting - IEDM | |
dc.source.conferencedate | 10/12/2012 | |
dc.source.conferencelocation | San Francisco, CA USA | |
imec.availability | Published - open access | |