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Silicon-germanium (SiGe) technology for MEMS and NEMS fabrication

dc.contributor.authorRottenberg, Xavier
dc.date.accessioned2021-10-20T15:31:07Z
dc.date.available2021-10-20T15:31:07Z
dc.date.issued2012-03
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21429
dc.sourceIIOimport
dc.titleSilicon-germanium (SiGe) technology for MEMS and NEMS fabrication
dc.typeJournal article
dc.contributor.imecauthorRottenberg, Xavier
dc.source.peerreviewno
dc.source.journalMEMS Investor Journal
dc.identifier.urlhttp://www.memsjournal.com/2012/03/silicon-germanium-sige-technolog-germanium-sige-technology-for-mems-and-nems-fabrication.html
imec.availabilityPublished - imec


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