Show simple item record

Modeling of copper diffusion in amorphous aluminum oxide in CBRAM memory stack

dc.contributor.authorSankaran, Kiroubanand
dc.contributor.authorGoux, Ludovic
dc.contributor.authorClima, Sergiu
dc.contributor.authorMees, Maarten
dc.contributor.authorKittl, Jorge
dc.contributor.authorJurczak, Gosia
dc.contributor.authorAltimime, Laith
dc.contributor.authorRignanese, Gian-Marco
dc.contributor.authorPourtois, Geoffrey
dc.date.accessioned2021-10-20T15:42:51Z
dc.date.available2021-10-20T15:42:51Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21455
dc.sourceIIOimport
dc.titleModeling of copper diffusion in amorphous aluminum oxide in CBRAM memory stack
dc.typeProceedings paper
dc.contributor.imecauthorSankaran, Kiroubanand
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.imecauthorClima, Sergiu
dc.contributor.imecauthorMees, Maarten
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.orcidimecSankaran, Kiroubanand::0000-0001-6988-7269
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.contributor.orcidimecClima, Sergiu::0000-0002-4044-9975
dc.contributor.orcidimecMees, Maarten::0000-0001-7217-5510
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage317
dc.source.endpage330
dc.source.conferenceDielectrics for Nanosystems 5: Materials Science, Processing, Reliability, and Manufacturing -and- Tutorials in Nanotechnology
dc.source.conferencedate6/05/2012
dc.source.conferencelocationSeattle, WA USA
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 45, Iss. 3


Files in this item

Thumbnail
Name:
24521.pdf
Size:
329.9Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record