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Spacer length and tilt implantation influence on scaled UTBOX FD MOSFETs

dc.contributor.authorSantos, S.D.
dc.contributor.authorNicoletti, T.
dc.contributor.authorAoulaiche, Marc
dc.contributor.authorMartino, J.A.
dc.contributor.authorVeloso, Anabela
dc.contributor.authorJurczak, Gosia
dc.contributor.authorSimoen, Eddy
dc.contributor.authorClaeys, Cor
dc.date.accessioned2021-10-20T15:43:46Z
dc.date.available2021-10-20T15:43:46Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21457
dc.sourceIIOimport
dc.titleSpacer length and tilt implantation influence on scaled UTBOX FD MOSFETs
dc.typeProceedings paper
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.source.peerreviewyes
dc.source.beginpage483
dc.source.endpage489
dc.source.conferenceProceedings of the 27th Symposium on Microelectronics Technology and Devices - SBMicro
dc.source.conferencedate30/08/2012
dc.source.conferencelocationBrasilia Brazil
imec.availabilityPublished - imec
imec.internalnotesECS Transactions; Vol. 49, Issue 1


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