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Hafnium oxide based CMOS compatible ferroelectric materials

dc.contributor.authorSchroeder, Uwe
dc.contributor.authorMartin, D.
dc.contributor.authorMueller, J.
dc.contributor.authorYurchuk, E.
dc.contributor.authorMueller, S.
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorSchloesser, T.
dc.contributor.authorvan Bentum, R.
dc.contributor.authorMikolajick, Thomas
dc.date.accessioned2021-10-20T15:53:39Z
dc.date.available2021-10-20T15:53:39Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21479
dc.sourceIIOimport
dc.titleHafnium oxide based CMOS compatible ferroelectric materials
dc.typeProceedings paper
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.source.peerreviewyes
dc.source.beginpage15
dc.source.endpage20
dc.source.conferenceDielectric Materials and Metals for Nanoelectronics and Photonics 10
dc.source.conferencedate7/10/2012
dc.source.conferencelocationHonolulu, HI USA
dc.identifier.urlhttp://ecst.ecsdl.org/content/50/4/15.abstract?sid=ae6626b4-0c76-404e-8927-e76443887628
imec.availabilityPublished - imec
imec.internalnotesECS Transactions; Vol. 50, Issue 4


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