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Si photonic device uniformity improvement using wafer-scale location specific processing

dc.contributor.authorSelvaraja, Shankar
dc.contributor.authorFernandez, Luis
dc.contributor.authorVanslembrouck, Michael
dc.contributor.authorEveraert, Jean-Luc
dc.contributor.authorDumon, Pieter
dc.contributor.authorVan Campenhout, Joris
dc.contributor.authorBogaerts, Wim
dc.contributor.authorAbsil, Philippe
dc.date.accessioned2021-10-20T15:57:02Z
dc.date.available2021-10-20T15:57:02Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21486
dc.sourceIIOimport
dc.titleSi photonic device uniformity improvement using wafer-scale location specific processing
dc.typeProceedings paper
dc.contributor.imecauthorVanslembrouck, Michael
dc.contributor.imecauthorEveraert, Jean-Luc
dc.contributor.imecauthorVan Campenhout, Joris
dc.contributor.imecauthorBogaerts, Wim
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.orcidimecVan Campenhout, Joris::0000-0003-0778-2669
dc.contributor.orcidimecBogaerts, Wim::0000-0003-1112-8950
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage725
dc.source.endpage726
dc.source.conferenceIEEE Photonics Conference
dc.source.conferencedate23/09/2012
dc.source.conferencelocationBurlingame, CA USA
imec.availabilityPublished - open access


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