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Plasma processing of low-k dielectrics

dc.contributor.authorShi, Hualiang
dc.contributor.authorShamiryan, Denis
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorHuang, Huai
dc.contributor.authorHo, Paul
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-20T16:02:54Z
dc.date.available2021-10-20T16:02:54Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21499
dc.sourceIIOimport
dc.titlePlasma processing of low-k dielectrics
dc.typeBook chapter
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage79
dc.source.bookAdvanced Interconnects for ULSI Technology
dc.source.endpage128
imec.availabilityPublished - open access


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