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The effect of CF4 contaminant gas on N2O oxidation

dc.contributor.authorKelleher, Ann
dc.contributor.authorElsmore, Chris
dc.contributor.authorSchaekers, Marc
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.contributor.authorMangelschots, G.
dc.date.accessioned2021-09-29T12:42:40Z
dc.date.available2021-09-29T12:42:40Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/214
dc.sourceIIOimport
dc.titleThe effect of CF4 contaminant gas on N2O oxidation
dc.typeOral presentation
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceProceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate19/09/1994
dc.source.conferencelocationBrugge Belgium
imec.availabilityPublished - open access
imec.internalnotesNot in proceedings


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