Show simple item record

Latest cluster performance for EUV lithography

dc.contributor.authorShite, Hideo
dc.contributor.authorMatsunaga, Koichi
dc.contributor.authorNafus, Kathleen
dc.contributor.authorKosugi, H.
dc.contributor.authorFoubert, Philippe
dc.contributor.authorHermans, Jan
dc.contributor.authorHendrickx, Eric
dc.contributor.authorGoethals, Mieke
dc.contributor.authorVan Den Heuvel, Dieter
dc.date.accessioned2021-10-20T16:05:26Z
dc.date.available2021-10-20T16:05:26Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21504
dc.sourceIIOimport
dc.titleLatest cluster performance for EUV lithography
dc.typeProceedings paper
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage83222Y
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography III
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE, vol.8322


Files in this item

Thumbnail
Name:
24952.pdf
Size:
619.6Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record